Liquid precursor for formation of materials containing alkali metals
Volatile liquid precursors (reagents) have been developed for the formation of alkali metal-containing materials using chemical vapor deposition (CVD), spray coating, spin coating or sol-gel deposition processes. The liquid precursors comprise alkali metal amides. Films containing alkali metals are deposited from vapors of the precursor liquids and, optionally, oxygen or other sources of oxygen.
Intellectual Property Status: Patent(s) Pending
This process may be used to deposit lithium niobate films having non-linear optical properties.