Novel apparatus turns liquids into vapors for use in chemical vapor deposition
The technology employs a high-frequency ultrasonic plate to break the liquid into tiny droplets and a gas-dynamic sorting tower to reprocess larger droplets into smaller ones before quickly vaporizing them. The vapor concentration can be set to a known and reproducible value by setting the pumping rate. The apparatus can rapidly start and stop the vapor flow. The pressure drop in the carrier gas is very small. Only a very small dead volume of liquid is contained in the apparatus at any given time, so little is wasted when the system is cleaned.
Intellectual Property Status: Patent(s) Pending
The device can vaporize liquids with high efficiency even if they have low vapor pressures and limited thermal stability. Potential application includes use in semiconductor manufacturing.