Vertical support structure to realize photonic structures from bulk substrates

This invention is a major step forward, consisting of a 3D nanofabrication method to fabricate the nanophotonic devices from the bulk crystal. It enables chip-scale nanophotonic devices with properties not available in conventional thin films. This invention holds the promise of being a basic foundational patent for future commercial applications of nanophotonics.


Nanophotonics offers great potential for telecommunications and computing. One barrier has been how to implement nanophotonic devices into conventional semiconductors.

U.S. Patent(s) Issued: US10281648B2